Document Type : Research Article
Authors
1 Department of Physics, Tomsk State University of Control Systems and Radioelectronics, 40 Lenina Avenue, Tomsk, 634050, Russia Laboratory of Plasma Sources, Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk, 634055, Russia
2 Department of Physics, Tomsk State University of Control Systems and Radioelectronics, 40 Lenina Avenue, Tomsk, 634050, Russia
3 Laboratory of Plasma Sources, Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk, 634055, Russia
Abstract
This paper presents a novel technique for producing alumina ceramic coatings based on the evaporation of an aluminum oxide target by an electron beam in the middle vacuum range (5-30 Pa). The evaporation of ceramics by the electron beam enables to attain a coating deposition rate of up to 0.3 µm/min, and thus consider this as a practical alternative to existing methods. A special attention is devoted to the study of the surfaces of obtained coatings. The X-ray fluorescence analysis of the deposited coating showed the presence in the coating of all the elements that contained in the ceramic target being evaporated. The coating has a substantially homogeneous surface without any prominent pores.
Keywords
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