Influence of oxygen partial pressure and annealing temperature on the physical properties of nanostructured ZnO thin films prepared by RF magnetron sputtering

R Subba Reddy; S Uthanna; A Sivasankar Reddy; T. Srikanth; B. Radha Krishna

Volume 3, Issue 9 , 2018, , Pages 570-576

  Zinc oxide thin films were deposited by RF magnetron sputtering on p-type (100) silicon and glass substrates held at room temperature by varying the oxygen partial pressures and the optimized films was annealing at different temperatures. The deposition rate of the films was decreased from 5.8 to 2.5 ...  Read More