DC magnetron sputtering: Impact of partial O2 pressure on the characteristics of Ag2O films

Nagendra Vara Prasad M; Jeevan Kumar R; Munikrishna Reddy Y

Volume 2, Issue 9 , 2017, , Pages 593-595


  In the present work, Ag2O films are deposited at room temperature using DCMS (Magnetron Sputtering) method with the variation of pressure of O2 during the development of film. The pressure of O2 in the DCMS unit chamber is arranged between 2X10-2 and 6X10-2 Pa. Transmission and absorption spectrum are ...  Read More