Study of transition regime for amorphous to nano-crystalline silicon thin films using 27.12 MHz PECVD: Insight into plasma kinetics

Deepika Chaudhary; Mansi Sharma; S. Sudhakar; Sushil Kumar

Volume 2, Issue 11 , 2017, , Pages 691-696

  In this article, we report the phase transition region of hydrogenated amorphous (a-Si:H) to nano-crystalline (nc-Si:H) silicon thin films deposited using 27.12 MHz assisted Plasma Enhanced Chemical vapor Deposition (PECVD) process with the approach of plasma diagnosis. This work presents for the first ...  Read More

Investigation of structural aspect in terms of atypical phases within material deposited for a-Si:H solar cell fabrication

Mansi Sharma; Deepika Chaudhary; s. Sudhakar; Preetam Singh; K.M.K. Srivatsa; Sushil Kumar

Volume 1, Issue 1 , 2016, , Pages 32-37

  The structural investigation of the a-Si:H material, deposited at different pressures by PECVD process, has been carried out to analyze the signatures of diffused intermediate sort of crystalline phases within the amorphous silicon matrix.  Raman characterization along with the Photoluminescence ...  Read More