Structural and electrical studies of thermally annealed tungsten nitride thin film

Sharmistha Anwar; Shahid Anwar

Volume 2, Issue 6 , 2017, , Pages 362-366

https://doi.org/10.5185/amp.2017/603

Abstract
  Present work is focused on various properties of thermally annealed tungsten nitride (WN) film. Tungsten nitride thin films on silicon (100) substrates were deposited via reactive magnetron sputtering technique. Initially Ar/N2 flow ratio was optimized by varying N2 gas flow between 5 to 25 sccm. 20:5 ...  Read More