Study of transition regime for amorphous to nano-crystalline silicon thin films using 27.12 MHz PECVD: Insight into plasma kinetics

Deepika Chaudhary; Mansi Sharma; S. Sudhakar; Sushil Kumar

Volume 2, Issue 11 , 2017, , Pages 691-696

https://doi.org/10.5185/amp.2017/644

Abstract
  In this article, we report the phase transition region of hydrogenated amorphous (a-Si:H) to nano-crystalline (nc-Si:H) silicon thin films deposited using 27.12 MHz assisted Plasma Enhanced Chemical vapor Deposition (PECVD) process with the approach of plasma diagnosis. This work presents for the first ...  Read More